Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same

ABSTRACT

A method for forming a self aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material having an affinity for portions of the existing pattern; and allowing at least a portion of the masking material to preferentially assemble to the portions of the existing pattern. The pattern may be comprised of a first set of regions of the substrate having a first atomic composition and a second set of regions of the substrate having a second atomic composition different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. The first and second regions may be treated to have different surface properties. Structures made in accordance with the method. Compositions useful for practicing the method.

CROSS REFERENCE TO RELATED APPLICATION

This application is related to the application entitled “NonlithographicMethod to Produce Mask by Selective Reaction, Articles Produced, andCompositions for Same” (docket number YOR920020155US1) by the sameinventors as the present invention, filed on the same day as the presentapplication, and assigned to the same assignee as the presentapplication and which is incorporated herein by reference as if fullyset forth herein.

FIELD OF THE INVENTION

This invention relates to the production of patterns on a substratehaving regions with different compositions or different surfacetreatment. More particularly, it relates to a method of producing finepatterns on substrates used in, for example, the microelectronicsindustry on which electronic devices are fabricated. It is also relatedto devices fabricated in accordance with the methods. The patterns arefabricated accurately and inexpensively without the use of lithography.The present invention also provides many additional advantages, whichshall become apparent as described below.

BACKGROUND OF THE INVENTION

A number of applications and technologies involve structures having awell-defined arrangement of chemically distinct components. Normally,these structures are defined by patterning processes such aslithography, embossing, and stamping, and have length scales rangingfrom 10 nanometers to several microns. In many of these systems it maybe necessary or highly beneficial to apply an additional component ortreatment to only one of the components at the surface. One commonlyused technique for doing this is through the use of a mask to protectregions where this additional application or treatment is not desired.Effectively, the mask material directs this treatment to the intendedsurfaces, which are fully exposed. Unfortunately, typical proceduresused to generate a mask by lithographic or other means can be expensiveand error prone. Thus, techniques for circumventing these conventionalapproaches would be highly advantageous.

A particular example in which such strategies would be useful involvesintegrated circuits comprised of metal and dielectric components. It iswidely known that the speed of propagation of interconnect signals isone of the most important factors controlling overall circuit speed asfeature sizes are reduced and the number of devices per unit area isincreased. Throughout the semiconductor industry, there has been astrong drive to reduce the dielectric constant, k, of the dielectricmaterials existing between metal lines and/or to minimize the thicknessof layers have comparatively larger dielectric constants, e.g., capbarrier layer. Both of these approaches reduce the effective dielectricconstant, k_(eff), of the components between metal lines and as aresult, interconnect signals travel faster through conductors due to areduction in resistance-capacitance (RC) delays. Unfortunately, thesestrategies are difficult to implement due to limitations in maintainingsufficient properties, i.e., mechanical, barrier, electrical, etc., thatresult with a reduction in thickness or a change in the chemistry of thelayers.

SUMMARY OF THE INVENTION

This invention relates to a method to fabricate mask layers onto apre-patterned substrate having two or more chemically distinct surfaceregions, or two or more surface regions that have undergone differentsurface treatment. The mask layer is deposited by a self-assemblyapproach that provides self-alignment of the layers. This method canapply to any technology or application involving a chemically orphysically heterogeneous substrate including: interconnect structuresfor high speed microprocessors, application specific integrated circuits(ASICs), flexible organic semiconductor chips, and memory storage. Otherstructures that can be fabricated utilizing this method include:displays, circuit boards, chip carriers, microelectromechanical systems(MEMS), chips for hi-thoughput screening, microfabricated fluidicdevices, etc. The utility of this method stems from a simple and robustmeans in which the replication of a patterned substrate to generate amask layer can be performed, circumventing the requirement for difficultand error prone methods, such as lithography. Thus, the presentinvention provides an extremely advantageous alternative to the priorart techniques.

In the example of integrated circuits, the effective dielectric constantis reduced by the use of a process where layers are selectively placedupon the metal lines. To do this, mask layers are first applied to thedielectric or hard mask surfaces. These layers are generated byself-assembly mechanisms described below. By using these processes thelayers can be self-aligned such that lithographic processes are notrequired to define the features. Upon self-alignment on thedielectric/hard-mask surfaces, these layers, can then be used as a maskfor subsequent deposition of other layers which serve as: diffusionbarriers to copper, oxygen and/or water, layers which reduce theelectromigration attributes of the metal lines, and seed layers.

Thus, in the example of integrated circuits, the use of the self-alignedmasks allows a simplified fabrication process in which the effectivedielectric constant between metal lines can be reduced through selectiveapplication of various materials to the metal lines. This is of greatimportance in maximizing the propagation speed of interconnect signalsand ultimately provides faster overall circuit performance. Furthermore,the present invention leads to a higher level of protection andreliability of interconnect structures and to reduced processing costs.

Another application of this invention is its use for semiconductorpackaging substrates which are comprised of conductors (usually copper)and insulators (usually epoxy, polyimide, alumina, cordierite glassceramic and the like) disposed adjacent to each other. The conductorscan be protected from external ambients, and process exposures such assoldering and wet etching. This protection can be achieved by using thevarious methods of forming selective coatings on the conductor.Alternately, selective coating on the dielectric by one of the exemplarymethods can leave the metal exposed for further processing by methodssuch as electroless plating to add additional metal layers such asnickel, cobalt, palladium, gold and others, on top, without exposing thedielectrics to these process steps.

The ability to accomplish these selective modifications without the useof lithographic processing leads to cost reductions and is particularlyadvantageous in microelectronic packaging which is very cost sensitive.

Although, the utilization of the self-aligned masks are described formicroelectronic parts, this method is envisioned to be useful for anyapplication whereby the modification of a specific component in apre-patterned substrate is beneficial.

Thus, the invention is directed to a method for forming a self alignedpattern on an existing pattern on a substrate comprising applying acoating of a solution containing a masking material in a carrier (orsolvent), the masking material having an affinity for portions of theexisting pattern; and allowing at least a portion of the maskingmaterial to preferentially assemble to the portions of the existingsubstrate pattern. The masking material may be an amorphous polymericsystem having any chain architecture (including linear, networked,branched, dendrimeric) and can contain one or more monomeric units.) Ingeneral, the masking material may be selected from the group consistingof: poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinylimidazoles) poly(stryenes), poly(esters), poly(methacrylates),poly(acrylates) and poly(glycols), polycarbonates, polyvinylacetatespolyalkyls, polyamides, polynitriles, polyureas, polyurethanes,polyethers, polysulfones, polythioethers, polyoxazoles, polyimides,polyheterocyclics, polysilicones, and polysilanes. In general, thesematerials have an affinity for dielectrics. The patterned substrate maybe comprised of a first set of regions of the substrate having a firstatomic composition and a second set of regions of the substrate having asecond atomic composition different from the first composition. Thefirst set of regions may include one or more metal elements and thesecond set of regions may include a dielectric.

The masking material may include a first polymer and a second polymer,the first polymer having an affinity for the first set of regions andthe second polymer having an affinity for the second set of regions, sothat the first polymer coats the first regions and the second polymercoats the second regions. The method may further comprise a step ofselectively removing the first polymer, leaving behind the secondpolymer on the second set of regions which can serve as the patterninglayer. This may be accomplished by rinsing, ultrasonication,dissolution, thermolysis, chemical reaction, irradiation, and/ordecomposition. The first set of regions may include one or more metalelements and the second set of regions may include a dielectric.

The first polymer is selected from the group consisting of: poly(vinylpyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles)poly(styrenes) and poly(esters), polyphosphazenes, polythiophenes,polyimines, polyheterocyclics: polyimides, polyoxazoles,polybenzoxazoles, polythiazoles, polypyrazoles, polytriazoles, andpolythiophenes. In general, these materials have an affinity for metals.The second polymer may be selected from the group consisting of:poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles)poly(stryenes), poly(esters), poly(methacrylates), poly(acrylates) andpoly(glycols), polycarbonates, polyvinylacetates polyalkyls, polyamides,polynitriles, polyureas, polyurethanes, polyethers, polysulfones,polythioethers, polyoxazoles, polyimides, polyheterocyclics,polysilicones, and polysilanes. As noted above, in general, thesematerials have an affinity for dielectrics.

The masking material may include a first polymer and a second polymerwhich are miscible. One of the polymers may be preferentially assembledto portions of the pattern due to a surface induced phase separation.

The masking material may be comprised of a block copolymer in whichblocks are covalently linked. When the pattern is comprised of a firstset of regions of the substrate having a first atomic composition and asecond set of regions of the substrate having a second atomiccomposition different from the first composition, a first polymer of theblock is attracted to the first regions and a second polymer of theblock is attracted to the second regions. For the specific case of ablock copolymer, a terraced topography may be formed which correspondsto the first regions and the second regions, the coating being thickerabove the second regions. The method may further comprise removing athickness of the masking material sufficient to expose the firstregions. The removing may be accomplished using a dry etch process. Afirst copolymer of the block may be selected from the group consistingof poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinylimidazoles) and poly(stryenes). A second copolymer may be selected fromthe group consisting of poly(styrenes), poly(methacrylates),poly(acrylates) and poly(glycols).

When the pattern is comprised of a first set of regions of the substratehaving a first atomic composition and a second set of regions of thesubstrate having a second atomic composition different from the firstcomposition, the masking material may have properties such that itdewets from the regions of first atomic composition and wets the regionsof second atomic composition. The first regions may include a metal andthe second regions may include a dielectric.

The masking material may be functionalized with a group that forms astrong physical attraction to substrate surface regions having thesecond atomic composition. The functionalized groups may be selectedfrom hydroxys, esters, ethers, aldehydes, ketones, carbonates, acids,phenols, amines, amides, imides, thioesters, thioethers, ureas,urethanes, nitriles, isocyanates, thiols, sulfones, halides, phosphines,phosphine oxides, phosphonimides, nitros, and azos.

The masking material is applied to the substrate by any method known inthe art, including but not limited to: spin-coating, dip coating, spraycoating, scan coating and using a doctor blade.

Regions of the substrate may be comprised of copper and may be patternedelectrical interconnects. The substrate may be a silicon wafercontaining microelectronic devices, a ceramic chip carrier, an organicchip carrier, a glass substrate, a gallium arsenide, silicon carbide orother semiconductor wafer, a circuit board, or a plastic substrate Themethod may further comprise chemically treating regions of the substrateprior to applying the coating. The chemically treating may be comprisedof at least one of plasma treatment, application of an oxidizing orreducing solution, annealing in an oxidizing or reducing atmosphere andapplication of a material that renders surface portions of thesubstrate, to which it is applied, hydrophobic or hydrophilic. Thechemical treatment may change the wetting characteristics of the regionsof the substrate. The chemically treating may comprise applying asurface modifying substance such as one of Si_(x)L_(y)R_(z), where L isselected from the group consisting of hydroxy, methoxy, ethoxy, acetoxy,alkoxy, carboxy, amines, halogens, R is selected from the groupconsisting of hydrido, methyl, ethyl, vinyl, phenyl (any alkyl or aryl).These materials may include: hexamethyldisilazane,vinyltriacetoxysilane, aminopropyltrimethoxysilane,trimethychlorosilane, trimethylacetoxysilane, and other various silanecoupling agents. The chemically treating may comprise applying a surfacemodifying substance having various functionalities that can involveacid/base interactions or hydrogen bonding.

The method may further comprise a step of chemically treating regions ofthe substrate prior to the coating with materials that have an affinityto metals. These materials include molecules having functional groupscomprising hydroxys, esters, ethers, aldehydes, ketones, carbonates,acids, phenols, amines, amides, imides, thioesters, thioethers, ureas,urethanes, nitriles, isocyanates, thiols, sulfones, halides, phosphines,phosphine oxides, phosphonimides, nitros, azos, thioesters, andthioethers. They can be heterocyclics, including benzotriazoles,pyridines, imidazoles, imides, oxazoles, benzoxazoles, thiazoles,pyrazoles, triazoles, thiophenes, oxadiazoles, thiazines, thiazoles,quionoxalines, benzimidazoles, oxindoles, and indolines.

The method may further comprise a step of annealing the substrate afterapplying the coating.

The invention is also directed to a structure comprising a self alignedpattern on an existing pattern on a substrate, the self aligned patternincluding a masking material having an affinity for portions of theexisting pattern, so that the masking material preferentially assembledto the portions of the existing pattern. The pattern may be comprised ofa first set of regions of the substrate having a first atomiccomposition and a second set of regions of the substrate having a secondatomic composition different from the first composition. The first setof regions may include one or more metal elements and the second set ofregions may include a dielectric. The self-aligned pattern may bedisposed upon the second set of regions, or only upon the second set ofregions. The self-aligned pattern is generally not disposed upon thefirst set of regions.

The structure may be comprised of at least one conductive feature,formed on the substrate, with the substrate further comprising at leastone insulating layer surrounding the conductive feature. The insulatinglayer may surround the at least one conductive feature at its bottom andlateral surfaces. The structure may further comprise at least oneconductive barrier layer disposed at, at least one interface between theinsulating layer and the at least one conductive feature. Thecombination of the at least one conductive feature and the insulatinglayers, may be repeated to form a multilevel interconnect stack.

The structure may be one of a silicon wafer containing microelectronicdevices, a ceramic chip carrier, an organic chip carrier, a glasssubstrate, a gallium arsenide, silicon carbide or other semiconductorwafer, a circuit board, or a plastic substrate.

Other and further objects, advantages and features of the presentinvention will be understood by reference to the following specificationin conjunction with the annexed drawings, wherein like parts have beengiven like numbers.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a general flow chart for the process of generating a selfaligned mask in accordance with the invention.

FIGS. 2 a, 2 b and 2 c illustrate first, second and third methods forgenerating self aligned masks in accordance with the invention, using amixture of polymers.

FIG. 3 illustrates a fourth method for generating a self aligned mask inaccordance with the invention, by block copolymer terracing.

FIG. 4 illustrates a fifth method for generating a self aligned mask inaccordance with the invention, by selective wetting.

FIG. 5 illustrates a sixth method for generating a self aligned mask inaccordance with the invention, by preferential adsorption.

FIG. 6 is a cross sectional view of a semiconductor device in accordancewith the invention.

FIG. 7 is a cross sectional view of another semiconductor device inaccordance with the invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

In accordance with the invention, a patterned substrate containingstructures having two or more distinct components is processed by aroute whereby layers can be applied to selected component surfaces. Thislayer can be generated by a number of self-assembly approaches describedbelow and can be used as a mask layer for subsequent treatment ormaterial deposition onto the intended component surfaces. Thesestructures can be sacrificial and, in general, do not remain in thefinal structure. The use of the masks for the generation of selfassembled barrier layers can proceed by a number of routes including:blanket deposition followed by lift-off, blanket deposition followed bychemical mechanical polishing (CMP), and enhancement of selectiveelectrochemical and electroless metal deposition processes. It will beclear to one skilled in the art that the application of a self-alignedlayer by any of the approaches described below can be used as a processto generate a selective mask.

The general approach is simple and is schematically demonstrated inFIG. 1. First, at step 1, a solution containing the self-aligning systemhaving one or more components is generated. Next, at step 2, a coatingis generated from this solution. The coating process in which the eachof the methods described below can be performed by any number of meansincluding: spin coating, dip coating, scan coating, spray coating, usinga doctor blade, etc. Optionally, the surface characteristics of one ormore of the exposed surfaces can be chemically modified, at 3, prior toapplication of the self aligning mask layer to facilitate each of themethods described below. Furthermore, thermal annealing 4 and dry etchsteps 5 may be included to define the final self aligned mask layer. Atstep 6, selected components may be removed from the substrate by varioustechniques including rinsing, ultrasonication, dissolution, thermolysis,chemical reaction, irradiation, and decomposition.

The optional chemical modification steps application of the self-alignedmask layer, described above in step 3 of FIG. 1, can be performed withany combination of modification schemes including: plasma treatment,application of an oxidizing or reducing solution, annealing in areducing or oxidizing atmosphere, and application of a material thatrenders surface portions of the substrate, to which it is applied, to behydrophobic or hydrophilic. Specific chemical treatments directed to thedielectric surface 10 may include applying an organosilane comprised ofSi_(x)L_(y)R_(z), where L is selected from the group consisting ofhydroxy, methoxy, ethoxy, acetoxy, alkoxy, carboxy, amines, halogens, Ris selected from the group consisting of hydrido, methyl, ethyl, vinyl,and phenyl (any alkyl or aryl). Specific chemical treatments directed tothe metal surface 20 may include applying molecules that havepreferential interactions with the metal surface including moleculeshaving the following functional groups: hydroxys, esters, ethers,aldehydes, ketones, carbonates, acids, phenols, amines, amides, imides,thioesters, thioethers, ureas, urethanes, nitriles, isocyanates, thiols,sulfones, halides, phosphines, phosphine oxides, phosphonimides, nitros,azos, thioesters, thioethers, benzotriazole, pyridines, imidazoles,imides, oxazoles, benzoxazoles, thiazoles, pyrazoles, triazoles,thiophenes, oxadiazoles, thiazines, thiazoles, quionoxalines,benzimidazoles, oxindoles, indolines, nitrogenous compounds, andphosphoric acids.

Referring to FIGS. 2 a, 2 b and 2 c, the preferred embodiment of thepatterned substrate is an interconnect structure having metal surfacesor regions 20 and dielectric surfaces or regions 10.

Referring to FIG. 2 a, a first method, in accordance with the invention,for pattern self-replication uses patterned matched phase separation ofa binary material system. An optional chemical modification of eitherthe dielectric surface 10 or metal surface 20, as described previously,can be first performed. A binary system, having polymeric components Aand B, is applied uniformly to the patterned substrate from solvent,e.g., by spin or dip coating. Phase separation into discrete A and Brich domains (200 and 100, respectively), can occur either duringcasting or with thermal annealing. Selective alignment of the domains orthe morphology occurs, as the A rich domains 200 segregate to metalsurfaces 20 and B rich domains 100 segregate to the dielectric surfaces10. Selective removal of the A rich domains 200 leads to a structurehaving the metal surfaces 20 and B rich domains 100 on the dielectricsurfaces 10. This structure can then be used as a mask layer forselective deposition by the aforementioned processes to the metalsurfaces 20.

For the first method, polymer A can be selected such that there is ahigh affinity to the metal surfaces 20 and no or unfavorable interfacialinteractions exist at the dielectric surface 10. Polymer A may be anamorphous polymeric system having any chain architecture (includinglinear, branched, dendrimeric) and can contain one or more monomericunits. They can be comprised of, but not limited, to the followingsystems: poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinylimidazoles), poly(styrenes), poly(esters), polyphosphazenes,polythiophenes, polyimines, polyheterocyclics: polyimides, polyoxazoles,polybenzoxazoles, polythiazoles, polypyazole, polytriazole andpolythiophenes. Polymer B also may be amorphous and can be selectedhaving the opposite attributes: high affinity to dielectric surfaces 10and no or unfavorable interfacial interactions with metal surface 20,and can be comprised of but not limited to the following systems:poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles)poly(stryenes), poly(esters), poly(methacrylates), poly(acrylates) andpoly(glycols), polycarbonates, polyvinylacetates polyalkyls, polyamides,polynitriles, polyureas, polyurethanes, polyethers, polysulfones,polythioethers, polyoxazoles, polyimides, polyheterocyclics,polysilicones and polysilanes. However, polymer A and Polymer B must becompositionally different.

Referring to FIG. 2 b, it should be noted that this approach is notlimited to systems where only A and B rich domains (200 and 100) arelocated above the metal and dielectric surfaces (20 and 10) throughoutthe entire coating thickness. A second method, in accordance with theinvention, for pattern self-replications allows for coatings withgreater morphological complexity, such as but not limited to bilayers,multilayers, and dispersed structures. Such more complex coatings maystill be utilized as self aligned mask layers if selective alignment atthe patterned substrate interface occurs. An example of such an approachis demonstrated in FIG. 2 b wherein a bilayer structure is located atopthe dielectric surfaces 10 and a morphology comprised of B rich domains100A is dispersed in a continuous matrix comprised of the A rich domains200. Selective removal of the material 200 containing the B rich domains100A leads to a self-aligned mask.

The preferred materials for the second method are essentially the sameas those of the first method.

Referring to FIG. 2 c, a third method, in accordance with the invention,for pattern self-replication uses A-B systems that normally do not phaseseparate. In such a case, the selective accumulation of A or B onto theintended surfaces will be based on a surface induced phase separationmechanism. For example, the A-B system can be selected such that A and Bform a miscible A-B phase 150. However, the presence of the dielectricsurface 10 induces an enrichment of a B rich domain at the dielectricsurface 10. Selective removal of the miscible A-B phase 150 can then beperformed, leaving a structure that can be utilized as a self-alignedmask.

The preferred materials for the third method are essentially the same asthose of the first method.

Referring to FIG. 3, a fourth method, in accordance with the invention,uses block copolymer terrace formation to replicate a preexistingpattern. An optional chemical modification of either the dielectricsurface 10 or metal surface 20, as described previously, can be firstperformed. A block copolymer comprised of A and B blocks is applieduniformly to the substrate surface. The two blocks have varyingaffinities to the two surfaces, resulting in a segregation of the Ablock to the metal surface 20 and the B block to the dielectric surface10. Ordering and alignment by the block copolymer domains produces acoating having a topography that is a replication of the underlyingsurface chemical heterogeneity 300. The film thickness is selected suchthat upon ordering, thicker regions of the film are generated on thedielectric surface 10. A controlled etch can then be applied to exposethe metal surfaces leaving some of the A-B material located upon thedielectric surface. The resultant film structure can then be used as amask for deposition of barrier layers onto the metal surfaces 20.

For this fourth method, the block copolymer comprises amorphouspolymeric blocks that microphase separate into discrete morpholgies(lamellae, cylinders, spheres, etc.). The A block can be selected suchthat there is a high affinity to the metal surfaces 20 and no orunfavorable interfacial interactions exist at the dielectric surface 10and can be comprised of but not limited to the following systems:poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles)poly(stryenes). The B block can be selected having the oppositeattributes, high affinity to dielectric surfaces 10 and no orunfavorable interfacial interactions with metal surface 20, and can becomprised of but not limited to the following systems: poly(styrenes),poly(methacrylates), poly(acrylates) and poly(glycols), etc.

Referring to FIG. 4, a fifth method, in accordance with the invention,uses a selective dewetting process to replicate a preexisting pattern.An optional chemical modification of either the dielectric surface 10 ormetal surface 20, as described previously, can be first performed. Themasking material 400 is then applied to the patterned substrate. Eitherduring casting or with thermal annealing, the masking material 400selectively dewets from the metal surfaces 20 due to unfavorablephysical interactions.

For the fifth method, the masking material is an amorphous polymericmaterial having any chain architecture (including linear, branched,dendrimeric) and can contain one or more monomeric units. The maskingmaterial can be comprised of but not limited to the following systems:poly(vinyl pyridines), poly(vinyl pyrrolidones), poly(vinyl imidazoles)poly(stryenes), poly(esters), poly(methacrylates), poly(acrylates) andpoly(glycols), polycarbonates, polyvinylacetates polyalkyls, polyamides,polynitriles, polyureas, polyurethanes, polyethers, polysulfones,polythioethers, polyoxazoles, polyimides, polyheterocyclics,polysilicones, and polysilanes, etc.

Referring to FIG. 5, a sixth method, in accordance with the invention,for pattern self-replication uses a masking material 500, having one ormore functional groups, that selectively adsorbs to the dielectricsurface 10. An optional chemical modification of either the dielectricsurface 10 or metal surface 20, as described previously, can be firstperformed. The material is spin coated or applied by any suitablecoating method to the pre-patterned substrate. Selective removal of themasking material 500 (for example, by rinsing with a solvent) is thenperformed to remove the masking material 500 from the metal surface 20where the physical adsorption does not occur. The displacement of thematerial in these regions effectively results in a self-aligned masklayer located solely on the dielectric surface 10.

For this sixth method, the masking material is an amorphous polymericmaterial having any chain architecture (including linear, branched,crosslinked dendrimeric) and can contain one or more monomeric units.The masking material contains one or more functional groups (denoted byA in FIG. 5) that are covalently bound to the polymer. The one or morefunctional groups can be located in the polymeric material in anyarrangement such that the polymer can be considered anend-functionalized polymer, random copolymer, block copolymer, etc.These functional groups can include but are not limited to: hydroxys,esters, ethers, thiols, aldehydes, ketones, carbonates, acids, phenols,amines, amides, imides, thioesters, thioethers, ureas, urethanes,nitriles, isocyanates, thiols, sulfones, halides, phosphines, phosphineoxides, phosphonimides, nitros, azos,

Use of the Above Methods in Fabricating IC Chips, Chip Carriers andCircuit Boards

Several derived structures can be fabricated using the selective maskingmethods described above. For purposes of the examples set forth below,the pre-existence of a substrate containing a pattern, the pattern beingcomprised of a first set of areas of the substrate surface having afirst atomic composition including one or more metal elements and havinga second set of areas of the substrate surface being a dielectric andhaving a second atomic composition different from the first composition,is presumed. Selective coverage of the dielectric surface is achievedfirst by one of the methods described above. The first set of regionswhich comprises one or metal elements is exposed and is then subjectedto processing steps such as electroless deposition alone or electolessdeposition of metal, metal or dielectric deposition by sputtering,evaporation, CVD, plasma enhanced CVD and the like, followed by anoptional planarization step to form added layers, generally only on thefirst set of regions.

The resulting structure is a microelectronic interconnect structurecomprised of at least one conductive feature with a selective cap on itstop surface, formed on a substrate, with the substrate furthercomprising at least one insulating layer surrounding the conductivefeature at its bottom and lateral surfaces and one or more optionalconductive barrier layers disposed at one or more of the interfacesbetween the insulator and the conductive feature.

Examples of this structural embodiment include but are not limited to:electrically conductive interconnect wiring which is capped and embeddedin a device chip interconnect stack containing insulators, conductingand insulating barrier layers and the like; interconnect wiring ofmetals disposed on a ceramic chip carrier package; and interconnectwiring disposed on and within an organic chip or device carrier such asa printed circuit board; and thin film wiring arrays on a glass orpolymeric substrate used in the fabrication of information displays andrelated hand held devices.

Referring to FIG. 6, an interconnect structure 30 having an interlayerdielectric 31, metal wiring 32, liner barrier layer 34, and cap barrierlayer 36 is illustrated. The interconnect structure has multiple levels1000 comprised of via 1100 and line 1200 levels. The preferred materialsfor the interlayer dielectric 31 have low dielectric constants (k<3) andinclude: carbon-doped silicon dioxide (also known as silicon oxycarbideor SiCOH dielectrics); fluorine-doped silicon oxide (also known asfluorosilicate glass, or FSG); spin-on glasses; silsesquioxanes,including hydrogen silsesquioxane (HSSQ), methyl silsesquioxane (MSSQ)and mixtures or copolymers of HSSQ and MSSQ; and any silicon-containinglow-k dielectric. As would be known in the art, this interlayerdielectric may contain pores to further reduce the dielectric constant,and other dielectrics may be used.

Referring to FIG. 7, an interconnect structure 40 having an interlayerdielectric 31, dielectric hardmask 41, metal wiring 32, liner barrierlayer 34, and cap barrier layer 36 is illustrated. The interconnectstructure has multiple levels 1000 comprised of via 1100 and line 1200levels. The preferred materials for the interlayer dielectric 31 havelow dielectric constants (k<3), may be an organic polymer thermoset, andmay be selected from the group SiLK™, (a product of Dow Chemical Co.),Flare™ (a product of Honeywell), and other polyarylene ethers. As wouldbe known in the art, this organic polymer dielectric may contain poresto further reduce the dielectric constant, and other organic polymerthermoset dielectrics may be used. The preferred materials for thedielectric hardmask 41 include: silicon carbides, carbon-doped silicondioxide (also known as silicon oxycarbide or SiCOH dielectrics);fluorine-doped silicon oxide (also known as fluorosilicate glass, orFSG); spin-on glasses; silsesquioxanes.

Applications of the inventive methods to form selective cap barrierlayers 36 on patterned metal interconnects are now described inreference to the structures shown in FIGS. 6 and 7 which may be producedusing any of the methods described herein. The structures may begenerated through a series of steps known in the art involvingphotolithography; dielectric deposition by spin coating or chemicalvapor deposition; metal deposition by electroplating, electolessplating, thermal evaporation, sputtering; planarization by chemicalmechanical polishing; wet and dry etch processes such as reactive ionetching; thermal anneals; wet and dry cleans, etc. The example givenincludes specific details, but it is evident that numerous alternatives,modifications and variations will be apparent to those skilled in theart in light of the methods descriptions given above. Various materialsmay form the selective cap (such as silicon nitride, or variousrefractory metals and compounds of said metals). Further, this inventionis not limited to constructions of any particular shape or composition.

The application of the methods described herein would be utilized afterchemical mechanical polishing steps that result in a patterned topsurface as shown in FIGS. 2-5. A preferred route to produce a selfaligned mask may be to apply a polymer mixture of polystyrene (PS) andpolymethylmethacrylate (PMMA) onto the patterned substrate by spincoating from a toluene solution and subsequently to remove thepolystyrene selectively by dissolution in cyclohexane to expose themetal lines resulting in a structure whereby the remainingpolymethylmethacrylate domains generates a topography which is used asthe self aligned mask.

In the next step, the PMMA is used as the self aligned mask. A bilayerof tantalum nitride (TaN) and tantalum is then deposited by sputteringin a sputter deposition tool (known in the art) on the patternedsubstrate containing the self aligned mask. The TaN/Ta bilayer contactsthe metal regions and conformally coats the PMMA. The wafer is thenplaced in a chemical mechanical polishing (CMP) tool and the bilayer isremoved from the PMMA, and is left intact on the metal regions.Subsequent, removal of the polymethylmethacrylate by dissolution intoluene produces the cap barrier layer 36 comprised of TaN and Ta onlyon the metal regions.

While we have shown and described several embodiments in accordance withour invention, it is to be clearly understood that the same aresusceptible to numerous changes apparent to one skilled in the art.Therefore, we do not wish to be limited to the details shown anddescribed but intend to show all changes and modifications that comewithin the scope of the appended claims.

1-49. (canceled)
 50. A composition for selectively coating a pattern ona substrate, said composition comprising: a carrier material forapplication to said substrate; a first polymer having an affinity forregions of said substrate having first chemical characteristics; and asecond polymer having an affinity for regions of said substrate havingsecond chemical characteristics different from said firstcharacteristics.
 51. The composition of claim 50, wherein the firstpolymer is selected from the group consisting of: poly(vinyl pyridines),poly(vinyl pyrrolidones), poly(vinyl imidazoles), poly(styrenes),poly(esters), polyphosphazenes, polythiophenes, polyimines,polyheterocyclics, polyimides, polyoxazoles, polybenzoxazoles,polythiazoles, polypyazole, polytriazole and polythiophene.
 52. Thecomposition of claim 50, wherein the second polymer is selected from thegroup consisting of: poly(vinyl pyridines), poly(vinyl pyrrolidones),poly(vinyl imidazoles) poly(stryenes), poly(esters),poly(methacrylates), poly(acrylates), poly(glycols), polycarbonates,polyvinylacetates, polyalkyls, polyamides, polynitriles, polyureas,polyurethanes, polyethers, polysulfones, polythioethers, polyoxazoles,polyimides, polyheterocyclics, polysilicones and polysilanes.
 53. Thecomposition of claim 50, wherein the second polymer contains functionalgroups selected from the groups consisting of: hydroxys, esters, ethers,aldehydes, ketones, carbonates, acids, phenols, amines, amides, imides,thioesters, thioethers, ureas, urethanes, nitriles, isocyanates, thiols,sulfones, halides, phosphines, phosphine oxides, phosphonimides, nitrosand azos.
 54. The composition of claim 50, wherein the first polymer andthe second polymer are miscible.
 55. The composition of claim 50,wherein the first polymer and the second polymer comprise a blockcopolymer in which the blocks are covalently linked.
 56. The compositionof claim 55, wherein a first copolymer of the block is selected from thegroup consisting of: poly(vinyl pyridines), poly(vinyl pyrrolidones),poly(vinyl imidazoles) and poly(stryenes).
 57. The composition of claim55, wherein a second copolymer of the block is selected from the groupconsisting of: poly(styrenes), poly(methacrylates), poly(acrylates) andpoly(glycols).
 58. The composition of claim 50, further comprising incombination, a surface modifying material for application to saidsubstrate prior to said composition, said surface modifying materialbeing selected from the group consisting of Si_(x)L_(y)R_(z), where L isselected from the group consisting of hydroxy, methoxy, ethoxy, acetoxy,alkoxy, carboxy, amines, halogens, and R is selected from the groupconsisting of hydrido, methyl, ethyl, vinyl, and phenyl (any alkyl oraryl).
 59. The composition of claim 50, further comprising incombination, a surface modifying material for application to saidsubstrate prior to said composition, said surface modifying materialbeing selected from the group consisting of: hexamethyldisilazane,vinyltriacetoxysilane, aminopropyltrimethoxysilane,trimethychlorosilane, and trimethylacetoxysilane.
 60. The composition ofclaim 50, further comprising in combination, a surface modifyingmaterial for application to said substrate prior to said composition,said surface modifying material being selected from the group consistingof: hydroxys, esters, ethers, aldehydes, ketones, carbonates, acids,phenols, amines, amides, imides, thioesters, thioethers, ureas,urethanes, nitriles, isocyanates, thiols, sulfones, halides, phosphines,phosphine oxides, phosphonimides, nitros, azos, thioesters, thioethers,benzotriazoles, pyridines, imidazoles, imides, oxazoles, benzoxazoles,thiazoles, pyrazoles, triazoles, thiophenes, oxadiazoles, thiazines,thiazoles, quionoxalines, benzimidazoles, oxindoles, and indolines.